SUBMISSION GUIDELINES

About Journal

The DSNLU Journal of Science, Technology & Law published by CIPR&T bearing E-ISSN No- 2583-1208, is a peer-reviewed, double-blind and open-access journal, with this Fourth Volume Second Issue discusses seminal themes of IP and Technology aspects of contemporary relevance.

The issue explores a wide spectrum of thoughts and through its varied articulations attempts to open up dialogues in diverse domains of application of intellectual property laws and Technology. The previous issue of the Journal focused on IPR, Biotechnology Law and Information Technology Law.

Eligibility

DSNLU Journal of Science, Technology and Law is accepting original and unpublished submissions from academicians, professionals, research scholars and students pursuing Under-graduate, Post-graduate and Ph. D.  programs from recognized Universities.

Theme

The peer-reviewed journal DSNLU Journal of Science, Technology and Law solicits high-quality articles pertaining to areas of Intellectual Property and Technology Law.

• Patent Law
• Copyright Law
• Industrial Designs Law
• Geographical Indications Law
• Trademark Law
• Trade Secrets Law
• Plant Varieties & Farmers Protection Law
• IPR and Dispute Resolution including the Role of Commercial Courts
• IPR and Artificial Intelligence
• Integration of IPR & Technology Laws
• Law of Semiconductor Integrated Circuits Layout
• Biotechnology Law
• IPR & International Trade Law
• IPR & International Law

Submission Guidelines

The authors must follow the guidelines given below:

• Manuscripts must be accompanied by a cover letter in a separate document containing the following details of the author and co-author(s) (if any):
  • Name:
  • Affiliation:
  • Academic Qualification:
  • Contact Number and e-mail address:
  • Postal address:
• The maximum number of authors permitted is two, i.e., one author and one co-author.
• The manuscript shall not contain the name or affiliation of the author(s).
• The manuscript must be accompanied by an abstract not exceeding 300 words, with five keywords. This must be the first page of the submission.
• Similarity must not exceed 10%.
• Co-authorship is not allowed in the case of Legislative Comments.
• The title of the manuscript must be [Your Name & Category of Submission].
  • Example: CIPR & Long Article
• Any manuscript found to contain AI-generated content shall not be considered for review and shall be disqualified summarily.

Submission Categories

• Long Articles: 5000 – 8000 Words

Long articles must be comprehensive and contain a rigorous in-depth analysis of the contemporary problem(s) and idea(s) relating to Intellectual Property Rights. It should include the identification of lacunae in the existing status quo along with alternatives, suggestions, and references to a range of sources.

• Short Articles: 3000 – 5000 Words

Short articles should rigorously analyze the contemporary problem(s) and idea(s) relating to Intellectual Property Rights. They should ideally identify lacunae in the existing status quo, provide solutions, and alternative suggestions, and should include references to a range of sources.

• Legislative Comment: 2000 – 3000 words

The legislative comment should provide a rigorous analysis of a recent legislative instrument. It should examine the objective of the legislation and the legal impact the same is expected to have.

• Case Comment:  2000 – 3000 words

The case comment should provide a rigorous analysis of a recent judicial precedent. It should examine the facts, issues, ratio decidendi, obiter dicta, the legal impact the same and/or any critique is expected to have.

Submission Deadline

All submissions should be made electronically in the form of an MS Word (.doc) file by filling out the google form.

Abstract Submission:  October 24, 2026

Selection of Abstract: November 7, 2026

Submission of Research Work: January 2, 2027

Previous Issues

The previous issues of the journal can be accessed here.

Contact Information

For any queries, please drop a mail to ipr@dsnlu.ac.in

Registration Link

The Registration link can be accessed here.